Embedded vertical inductor in laminate stacked substrates

ABSTRACT

A vertical inductor structure includes a first laminate substrate forming a first portion of the vertical inductor structure and a second laminate substrate forming a second portion. Each laminate substrate includes a plurality of first traces embedded in a layer of the laminate substrate, a plurality of first vertical columns, and a plurality of second vertical columns. Each first vertical columns is coupled to a first end of a respective first trace, and each second vertical column is coupled to a second end of a respective first trace. The second laminate substrate is mounted on the first laminate substrate such that each first vertical column of the first laminate substrate is coupled to a respective first vertical column of the second laminate substrate, and each second vertical column of the first laminate substrate is coupled to a respective second vertical column of the second laminate substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

The application claims the benefit of U.S. Provisional Application No.62/599,397, filed Dec. 15, 2017, and titled “Embedded Vertical Inductorin Laminate Stacked Substrates,” the disclosure of which is expresslyincorporated by reference herein in its entirety.

TECHNICAL FIELD

The present disclosure generally relates to inductors, and moreparticularly to an embedded vertical inductor in laminate stackedsubstrates for high-quality (Q)-factor radio frequency (RF)applications.

BACKGROUND

Mobile radio frequency (RF) chip designs (e.g., mobile RF transceivers)have migrated to a deep sub-micron process node due to cost and powerconsumption considerations. The design complexity of mobile RFtransceivers is complicated by added circuit functions to supportcommunication enhancements, such as carrier aggregation. Further designchallenges for mobile RF transceivers include analog/RF performanceconsiderations, including mismatch, noise and other performanceconsiderations. The design of mobile RF transceivers includes the use ofpassive devices, such as inductors and capacitors, to, for example,suppress resonance, and/or to perform filtering, bypassing and coupling.As mobile RF transceivers become more advanced and complex, variouscomponents of the mobile RF transceivers are faced with increasing sizeand performance constraints, such as reducing their size/footprint whilemaintaining or increasing their performance.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagram of a radio frequency (RF) communication system inaccordance with an aspect of the disclosure.

FIG. 2A is a perspective view of a vertical inductor structure inlaminate stacked substrates according to aspects of the presentdisclosure.

FIG. 2B is an end view of the vertical inductor structure of FIG. 2A,shown embedded in laminate stacked substrates.

FIGS. 2C and 2D are two cross-sectional views taken generally along theline A-A of FIG. 2A, showing the vertical inductor structure embedded inlaminate stacked substrates.

FIG. 3A shows a perspective view of another vertical inductor structure,and

FIG. 3B shows a cross-sectional view taken generally along the line A-Aof FIG. 3A, showing the vertical inductor structure embedded in laminatestacked substrates according to aspects of the present disclosure.

FIG. 4A shows a perspective view of another vertical inductor structure,and

FIG. 4B shows a cross-sectional view taken generally along the line A-Aof FIG. 4A, showing the vertical inductor structure embedded in laminatestacked substrates according to further aspects of the presentdisclosure.

FIG. 5A shows a perspective view of another vertical inductor structure,and

FIG. 5B shows a cross-sectional view taken generally along the line A-Aof FIG. 5A, showing the vertical inductor structure embedded in laminatestacked substrates according to further aspects of the presentdisclosure.

FIG. 6 is a flow diagram illustrating a method of fabricating anembedded vertical inductor structure in laminate stacked substratesaccording to aspects of the disclosure.

FIG. 7 is a block diagram showing an exemplary wireless communicationsystem in which a configuration of the disclosure may be advantageouslyemployed.

FIG. 8 is a block diagram illustrating a design workstation used forcircuit, layout, and logic design of a semiconductor component accordingto one configuration.

DETAILED DESCRIPTION

The detailed description set forth below, in connection with theappended drawings, is intended as a description of variousconfigurations and is not intended to represent the only configurationsin which the concepts described herein may be practiced. The detaileddescription includes specific details for the purpose of providing athorough understanding of the various concepts. It will be apparent tothose skilled in the art, however, that these concepts may be practicedwithout these specific details. In some instances, well-known structuresand components are shown in block diagram form in order to avoidobscuring such concepts. As described herein, the use of the term“and/or” is intended to represent an “inclusive OR,” and the use of theterm “or” is intended to represent an “exclusive OR.”

Mobile RF transceivers have migrated to a deep sub-micron process nodedue to cost and power consumption considerations. The design complexityof mobile RF transceivers is complicated by added circuit functions tosupport communication enhancements, such as carrier aggregation. Furtherdesign challenges for mobile RF transceivers include analog/RFperformance considerations, including mismatch, noise and otherperformance considerations. The design of mobile RF transceiversincludes the use of passive devices, such as inductors and capacitors,to, for example, suppress resonance, and/or to perform filtering,bypassing and coupling. As mobile RF transceivers become more advancedand complex, various components of the mobile RF transceivers are facedwith increasing size and performance constraints, namely to reduce theirsize/footprint while maintaining or increasing their performance.

An inductor is an example of an electrical device used to temporarilystore energy in a magnetic field within a wire coil according to aninductance value. This inductance value provides a measure of the ratioof voltage to the rate of change of current passing through theinductor. While the current flowing through an inductor changes, energyis temporarily stored in a magnetic field in the coil. In addition totheir magnetic field storing capability, inductors are often used inalternating current (AC) electronic equipment, such as radio equipment.For example, the design of mobile RF transceivers includes the use ofinductors with improved inductance density while reducing magnetic lossat high frequency (e.g., 500 megahertz (MHz) to 5 gigahertz (GHz) RFrange).

According to aspects of the present disclosure, a duplexer may bearranged in a power amplifier (PA) integrated duplexer (PAMID) module ora front-end module with integrated duplexer (FEMID) module, in which theduplexer is integrated with a laminate substrate inductor, such as alaminate integrated inductor. The use of single substrate laminateintegrated inductors may replace the use of surface mount devices withinRF front-end modules due to spacing constraints. Unfortunately, the areaoccupied by the laminate integrated inductors within a substrate (e.g.,a package substrate) may also be constrained due to customerspecifications. For example, the substrate generally includes groundplanes to meet isolation specifications to avoid interference betweenthe laminate integrated inductors and the duplexers. In addition, avertical height of the inductor may be restricted due to customerspecifications. Unfortunately, the ground planes of the substrate maycompress a magnetic field of the single substrate laminate integratedinductors, which reduces the quality (Q)-factor when the laminateintegrated inductors are arranged within a single laminate substrate.

Aspects of the present disclosure describe a vertical inductor structureembedded in laminate stacked substrates for high Q-factor RFapplications. In one arrangement a vertical inductor structure includesa first laminate substrate forming a first portion of the verticalinductor structure and a second laminate substrate forming a secondportion of the vertical inductor structure. The second laminatesubstrate is mounted on the first laminate substrate. Each of the firstand second laminate substrates includes a plurality of traces embeddedin a layer of the laminate substrate, a plurality of first verticalcolumns and a plurality of second vertical columns. Each of the tracesis coupled at a first end to one of the first vertical columns and at asecond end to one of the second vertical columns. The second laminatesubstrate is mounted on the first laminate substrate, such that each ofthe first vertical columns of the first laminate substrate is coupled toa respective first vertical column of the second laminate substrate, andeach of the second vertical columns of the first laminate substrate iscoupled to a respective second vertical column of the second laminatesubstrate.

In contrast to a conventional single substrate laminate inductor, theimproved inductor design is a vertical inductor embedded in multiplelaminate stacked substrates. Embedding the vertical inductor in twolaminate substrates provides flexibility to achieve a targeted inductorperformance at a reduced inductor footprint. Each laminate substrate mayhave any number of layers, for example between two layers and tenlayers, and the vertical height of the inductor structure may rangebetween 50 μm and 600 μm and be optimized to achieve a particularQ-factor. In addition, layers in the first laminate substrate mayprovide a desired separation between the inductor and the ground planeof the substrate, so that the magnetic field of the inductor is notcompressed, thereby improving the Q-factor of the inductor. Similarly,above the top surface of the inductor, additional layers or molding maybe provided to distance the inductor from the module shield ground, soas not to compress the magnetic field of the inductor at the upper end.An improved vertical inductor structure having an area of less than 0.6mm² may have a Q-factor of up to 40 for 2.5 nH at 800 MHz and 85□.

One goal driving the wireless communications industry is providingcustomers with increased bandwidth. The use of carrier aggregation incurrent generation communications provides one possible solution forachieving this goal. For wireless communication, passive devices areused to process signals in carrier aggregation systems. In these carrieraggregation systems, signals are communicated with both high band andlow band frequencies. In a RF front-end (RFFE) module, a power amplifier(PA) may be integrated with a passive device (e.g., a duplexer) toprovide a PAMID module. In addition, a front-end module may beintegrated with a duplexer to provide a FEMID module. A duplexer (e.g.,an acoustic filter) may be configured for simultaneous transmission andreception within the same band (e.g., a low band) to support carrieraggregation.

FIG. 1 is a schematic diagram of a RF communications system 100including a vertical inductor structure integrated with a duplexer 180according to an aspect of the present disclosure. Representatively, theRF communications system 100 includes a WiFi module 170 having a firstduplexer 190-1 and an RF front-end module 150 including a secondduplexer 190-2 for a chipset 160 to provide carrier aggregationaccording to an aspect of the present disclosure. The WiFi module 170includes the first diplexer 190-1 communicably coupling an antenna 192to a wireless local area network module (e.g., WLAN module 172). The RFfront-end module 150 includes the second diplexer 190-2 communicablycoupling an antenna 194 to a wireless transceiver (WTR) 120 through theduplexer 180. The wireless transceiver 120 and the WLAN module 172 ofthe WiFi module 170 are coupled to a modem (mobile station modem (MSM),e.g., baseband modem) 130 that is powered by a power supply 152 througha power management integrated circuit (PMIC) 156.

The chipset 160 also includes capacitors 162 and 164, as well as aninductor(s) 166 to provide signal integrity. The PMIC 156, the modem130, the wireless transceiver 120, and the WLAN module 172 each includecapacitors (e.g., 158, 132, 122, and 174) and operate according to aclock 154. The geometry and arrangement of the various inductor andcapacitor components in the chipset 160 may reduce the electromagneticcoupling between the components. The RF communications system 100 mayalso include a power amplifier (PA) integrated with the duplexer 180(e.g., a PAMID module). The duplexer 180 may filter the input/outputsignals according to a variety of different parameters, includingfrequency, insertion loss, rejection, or other like parameters.According to aspects of the present disclosure, the duplexer 180 may beintegrated with an embedded vertical inductor in laminate stackedsubstrates, for example, as shown in FIGS. 2A-5B.

FIG. 2A shows a perspective view of a vertical inductor structure 210according to aspects of the present disclosure. FIGS. 2B-2D show end andcross-sectional views of the vertical inductor structure 210 embedded inlaminate stacked substrates. The vertical inductor structure 210 mayinclude a first portion 212 and a second portion 214. The first portion212 of the vertical inductor structure 210 may be formed in a firstlaminate substrate 216, and the second portion 214 may be formed in asecond laminate substrate 218. Each of the first laminate substrate 216and the second laminate substrate 218 may have any number of a pluralityof layers, for example, between 2 layers and 10 layers. For example, thefirst laminate substrate 216 may include 8 layers, while the secondlaminate substrate 218 may include the same number of layers, in thisexample, 8 layers, or the second laminate substrate 218 may include moreor fewer layers than the first laminate substrate 216.

The first laminate substrate 216 and the second laminate substrate 218may include a plurality of traces 220(1) and 220(2), respectively, thatform part of the vertical inductor structure 210. Each of the traces220(1), 220(2) may be provided in a single layer 222(1), 222(2),respectively, of the respective first laminate substrate 216 and thesecond laminate substrate 218. As shown in FIGS. 2A-2D, the traces220(1) of the first laminate substrate 216 may form the bottom traces ofthe vertical inductor structure 210, while the traces 220(2) of thesecond laminate substrate 218 may form the top traces of the verticalinductor structure 210. The traces 220(1), 220(2) may be comprised ofcopper or any other conductive material.

The first laminate substrate 216 may further include vertical columns224(1), 224(2) that are coupled to the traces 220(1) at a respectivefirst end 226 and second end 228. Similarly, the second laminatesubstrate 218 may include vertical columns 224(3), 224(4) that arecoupled to the traces 220(2) at the respective first end 226 and secondend 228. The vertical columns 224(1)-224(4) may be comprised of stacked,metal-filled vias 230 and capture pads 232. Copper is one conductivemetal that may be used to form the metal-filled vias 230 and capturepads 232 of the vertical columns 224(1)-224(4), however, otherconductive materials may also be used.

The second laminate substrate 218 may be mounted on the first laminatesubstrate 216 to complete the vertical inductor structure 210. At thefirst end 226, each of the vertical columns 224(1) of the first laminatesubstrate 216 may be electrically and mechanically coupled to arespective vertical column 224(3) of the second laminate substrate 218by a bump 234. Similarly, at the second end 228, each of the verticalcolumns 224(2) of the first laminate substrate 216 may be electricallyand mechanically coupled to a respective vertical column 224(4) of thesecond laminate substrate 218 by a bump 234. The bumps 234 may be solderballs and composed of a conductive material. Alternatively, the bumps234 may be other types of bumps that provide electrical and mechanicalconnections, such as flip-chip bumps, ball grid array bumps, solder onpads (SOP), or copper pillars.

Referring still to FIGS. 2B-2D, the vertical inductor structure 210 mayinclude an optional module ground 236. The module ground 236 may beformed in the bottom-most M8 layer of the first laminate substrate 216.The vertical inductor structure 210 may further include a molding 238that is provided over and/or around the second laminate substrate 218 aswell as a module shield layer 240. The molding 238 may be comprised of apolymer material.

As mentioned above, each of the first laminate substrate 216 and thesecond laminate substrate 218 may be provided with any multiple numberof layers. For example, in FIGS. 2B and 2C, the first laminate substrate216 includes 4 layers that separate the bottom traces 220(1) of thevertical inductor structure 210 from the module ground 236. The distancebetween the bottom traces 220(1) of the vertical inductor structure 210and the module ground 236 maybe adjusted by increasing or decreasing thenumber of layers provided therebetween to prevent magnetic fieldcompression and coupling from the module ground 236. The second laminatesubstrate 218, in FIGS. 2B and 2C is also shown as having 4 layers thatseparate the top traces 220(2) of the vertical inductor structure 210from the molding 238. These layers of the second laminate substrate 218along with the molding 238 may provide a separation between the toptraces 220(2) of the vertical inductor structure 210 and the moduleshield layer 240 to also prevent magnetic field compression and couplingfrom the module shield. It should be noted, that the second laminatesubstrate 218 may be provided with fewer or more layers above the toptraces 220(2) of the vertical inductor structure 210, and instead thethickness of the molding 238 may be increased or decreased to achievethe desired separation from the module shield layer 240.

Aspects of the present disclosure provide the multi-substrate verticalinductor structure 210 with a flexible design that has a smallerfootprint than a comparably performing single substrate inductor or oneformed in a through glass via (TGV) or through substrate via (TSV)module. For example, the height of vertical columns 224(1)-224(4) may beanywhere in the range of 50 μm to 600 μm to achieve a target inductorperformance. In addition, the additional layers or molding 238 may beused to distance the traces 220(1), 220(2) of the vertical inductorstructure 210 from the module ground 236 and the module shield layer240.

FIG. 3A shows a perspective view of a vertical inductor structure 310according to other aspects of the present disclosure, and FIG. 3B showsa cross-sectional view of the vertical inductor structure 310 embeddedin laminate stacked substrates. The vertical inductor structure 310 issimilar to the vertical inductor structure 210 of FIGS. 2A-2D, exceptthat the vertical inductor structure 310 includes two layers of tracesin each laminate substrate.

The vertical inductor structure 310 may include a first portion 312formed in a first laminate substrate 316 and a second portion 314 formedin a second laminate substrate 318. Each of the first laminate substrate316 and the second laminate substrate 318 may have any number of aplurality of layers, for example, between 2 layers and 10 layers, andneed not have the same number of layers as the other laminate substrate.

The first laminate substrate 316 and the second laminate substrate 318may include a plurality of first traces 320(1) and 320(2), respectively,and a plurality of second traces 320(3) and 320(4), respectively, thatform part of the vertical inductor structure 310. Each of the firsttraces 320(1), 320(2) may be provided in a single layer 322(1), 322(2),respectively, of the respective first laminate substrate 316 and thesecond laminate substrate 318. Similarly, each of the second traces320(3), 320(4) may be provided in an another single layer 322(3),322(4), respectively, of the respective first laminate substrate 316 andthe second laminate substrate 318. The traces 320(1)-320(4) may becomprised of copper or any other conductive material.

The first laminate substrate 316 may further include vertical columns324(1) that are coupled to the first traces 320(1) and the second traces320(3) at a first end 326, and vertical columns 324(2) that are coupledto the first traces 320(1) and the second traces 320(3) at a second end328. Similarly, the second laminate substrate 318 may include verticalcolumns 324(3) that are coupled to the first traces 320(2) and thesecond traces 320(4) at the first end 326, and vertical columns 324(4)that are coupled to the first traces 320(2) and the second traces 320(4)at the second end 328. The vertical columns 324(1)-324(4) may be made ofcopper or any other conductive material and may be comprised of stacked,metal-filled vias and capture pads.

The second laminate substrate 318 may be mounted on the first laminatesubstrate 318 to complete the vertical inductor structure 310. At thefirst end 326, each of the vertical columns 324(1) of the first laminatesubstrate 316 may be electrically and mechanically coupled to arespective vertical column 324(3) of the second laminate substrate 318by a bump 334. Similarly, at the second end 328, each of the verticalcolumns 324(2) of the first laminate substrate 316 may be electricallyand mechanically coupled to a respective vertical column 324(4) of thesecond laminate substrate 318 by a bump 334. The bumps 334 may be solderballs and are composed of a conductive material. Alternatively, thebumps 334 may be other types of bumps that provide electrical andmechanical connections, such as flip-chip bumps, ball grid array bumps,solder on pads (SOP), or copper pillars.

Like the vertical inductor structure 210 of FIGS. 2A-2D, the verticalinductor structure 310 may also be provided with an optional moduleground 336 from the bottom layer of the first laminate substrate 316,molding 338 and a module shield layer 340. As mentioned above, the firstlaminate substrate 316 may be provided with additional layers below thefirst traces 320(1) to provide a desired distance between the moduleground 336 and the vertical inductor structure 310. Similarly, thesecond laminate substrate 318 may be provided with additional layersabove the first traces 320(2) and/or the thickness of the molding 338may be increased/decreased to adjust a distance between the verticalinductor structure 310 and the module shield layer 340.

FIG. 4A shows a perspective view of a vertical inductor structure 410according to still other aspects of the present disclosure, and FIG. 4Bshows a cross-sectional view of the vertical inductor structure 410embedded in laminate stacked substrates. The vertical inductor structure410 is similar in many ways to the vertical inductor structure 310 ofFIGS. 3A-3B, and, for simplicity, the same reference numerals will beused for like parts. The difference between the two vertical inductorstructures is that the vertical inductor structure 410 may furtherinclude metal-filled vias 442 coupling the two layers of traces in eachlaminate substrate. The first laminate substrate 316 may includemetal-filled vias 442(1) that couple the first traces 320(1) of thefirst laminate substrate 316 to the second traces 320(3). Similarly, thesecond laminate substrate 318 may include metal-filled vias 442(2) thatcouple the first traces 320(2) of the second laminate substrate 318 tothe second traces 320(4). The metal-filled vias 442(1), 442(2) arecoupled to the respective first traces 320(1), 320(2) and the respectivesecond traces 320(3), 320(4) between the first end 326 and the secondend 328. The metal-filled vias 442(1), 442(2) improve the inductance ofthe traces 320(1)-320(4). Any number of metal-filled vias 442(1), 442(2)may be provided along the traces 320(1)-320(4). For example, althoughthe vertical inductor structure 410 is shown in FIG. 4B having 2metal-filled vias 442(1), 442(2) between the first traces 320(1), 320(2)and the second traces 320(3), 320(4), more than 2 metal-filled vias442(1), 442(2) may be provided between the traces 320(1)-320(4).Alternatively, the vertical inductor structure 410 may include a singlemetal-filled via 442(1), 442(2) may between the first traces 320(1),320(2) and the second traces 320(3), 320(4). The metal-filled vias442(1), 442(2) may be composed of copper or any other conductivematerial.

FIG. 5A shows a perspective view of a vertical inductor structure 510according to still other aspects of the present disclosure, and FIG. 4Bshows a cross-sectional view of the vertical inductor structure 510embedded in laminate stacked substrates. The vertical inductor structure510 is very similar to the vertical inductor structure 410 of FIGS.4A-4B, and, for simplicity, the same reference numerals will again beused for like parts. The difference between the two vertical inductorstructures is that the vertical inductor structure 510 may furtherinclude additional vertical columns to couple the first traces 320(1)and the second traces 320(3) of the first laminate substrate 316 to thefirst traces 320(2) and the second traces 320(4) of the second laminatesubstrate 318.

In addition to the vertical columns 324(1), 324(2), the first laminatesubstrate 316 may further include vertical columns 544(1), 544(2). Thevertical columns 544(1) are coupled to the traces 320(1), 320(3)proximate the first end 326, while the vertical columns 544(2) arecoupled to the traces 320(1), 320(3) proximate the second end 328.Similarly, the second laminate substrate 318 may include verticalcolumns 544(3), 544(4) that are coupled to the traces 320(2), 320(4)proximate the first end 326 and the second end 328, respectively. Thevertical columns 544(1)-544(4) may be comprised of stacked, metal-filledvias 330 and capture pads 332. Copper is one conductive metal that maybe used to form the metal-filled vias 330 and capture pads 332 of thevertical columns 544(1)-544(4), however, other conductive materials mayalso be used. The vertical columns 544(1)-544(4) reduce the resistancein the vertical portion of the vertical inductor structure 510.

The second laminate substrate 318 may be mounted on the first laminatesubstrate 316 to complete the vertical inductor structure 510. At thefirst end 326, bumps 334 may electrically and mechanically couple eachof the vertical columns 324(1), 544(1) of the first laminate substrate316 to a respective vertical column 324(3), 544(3) of the secondlaminate substrate 318. Similarly, at the second end 328, bumps 334 mayelectrically and mechanically couple each of the vertical columns324(2), 544(2) of the first laminate substrate 316 to a respectivevertical column 324(4), 544(4) of the second laminate substrate 318. Thebumps 334 may be solder balls and composed of a conductive material.Alternatively, the bumps 234 may be other types of bumps that provideelectrical and mechanical connections, such as flip-chip bumps, ballgrid array bumps, solder on pads (SOP), or copper pillars.

FIG. 6 is a flow diagram illustrating a method 600 of fabricating anembedded vertical inductor structure in laminate stacked substrateaccording to aspects of the disclosure. At block 602, a first laminatesubstrate 216, 316 forming a first portion of the vertical inductorstructure is provided. The first laminate substrate may be the firstlaminate substrate 216 of the vertical inductor structure 210 of FIGS.2A-2D with a single layer of traces 220(1). Alternatively, the firstlaminate substrate 316 may be provided with any one of the following:two layers of traces 320(1), 320(3), as in the vertical inductorstructure 310 of FIGS. 3A-3B; two layers of traces 320(1), 320(3) andmetal-filled vias 442(1) coupling the first and second traces 320(1) and320(3), respectively, as in the vertical inductor structure 410 of FIGS.4A-4B; and two layers of traces 320(1), 320(3), metal-filled vias442(1), and additional vertical columns 544(1), 544(2), as in thevertical inductor structure 510 of FIGS. 5A-5B. The first laminatestructure may also be provided with an optional module ground 236, 336.

At block 604, a second laminate substrate 218, 318 may be provided onthe first laminate substrate 216, 316. The second laminate substrate218, 318 forms a second portion of the vertical inductor structure. Thesecond laminate substrate may be the second laminate substrate 218 ofthe vertical inductor structure 210 of FIGS. 2A-2D with a single layerof traces 220(2). Alternatively, the second laminate substrate 318 maybe provided with any one of the following: two layers of traces 320(2),320(4), as in the vertical inductor structure 310 of FIGS. 3A-3B; twolayers of traces 320(2), 320(4) and metal-filled vias 442(2) couplingthe first and second traces 320(2) and 320(4), respectively, as in thevertical inductor structure 410 of FIGS. 4A-4B; and two layers of traces320(2), 320(4), metal-filled vias 442(2), and additional verticalcolumns 544(3), 544(4), as in the vertical inductor structure 510 ofFIGS. 5A-5B.

The second laminate substrate 218, 318 is electrically and mechanicallycoupled to the first laminate substrate 216, 316 using bumps 234, 334.The bumps 234, 334 may be solder balls and composed of a conductivematerial. Alternatively, the bumps 234, 334 may be other types of bumpsthat provide electrical and mechanical connections, such as flip-chipbumps, ball grid array bumps, solder on pads (SOP), or copper pillars.

At block 606, molding 238, 338 is provided over the first laminatesubstrate 216, 316 and around the second laminate substrate 218, 318.The molding also fills the gap between the first laminate substrate 216,316 and the second laminate substate 218, 318. The molding 238, 338 iscomposed of a polymer material.

At block 608, a module shield layer 240, 340 may be provided over themolding 238, 338. At step 606, the thickness of the molding, 338 may becontrolled to provide a desired separation between the top traces220(2), 320(3) of the vertical inductor structure 210, 310, 410, 510 andthe module shield layer 240, 340 so as not to compress the magneticfield of the vertical inductor structure.

FIG. 7 is a block diagram showing an exemplary wireless communicationsystem 700 in which an aspect of the disclosure may be advantageouslyemployed. For purposes of illustration, FIG. 7 shows three remote units720, 730 and 750 and two base stations 740. It will be recognized thatwireless communication systems may have many more remote units and basestations. Remote units 720, 730 and 750 each include IC devices 725A,725C, and 725B having a RF front-end module that includes the disclosedinductors. It will be recognized that other devices may also include thedisclosed inductors, such as the base stations, switching devices, andnetwork equipment including a RF front-end module. FIG. 7 shows forwardlink signals 780 from the base station 740 to the remote units 720, 730and 750 and reverse link signals 790 from the remote units 720, 730 and750 to the base stations 740.

In FIG. 7 a remote unit 720 is shown as a mobile telephone, remote unit730 is shown as a portable computer, and remote unit 750 is shown as afixed location remote unit in a wireless local loop system. For example,the remote units 720, 730 and 750 may be a mobile phone, a hand-heldpersonal communications systems (PCS) unit, a portable data unit such asa personal digital assistant (PDA), a GPS enabled device, a navigationdevice, a set top box, a music player, a video player, an entertainmentunit, a fixed location data unit such as a meter reading equipment, or acommunications device, including an RF front-end module that stores orretrieves data or computer instructions, or combinations thereof.Although FIG. 7 illustrates remote units according to the aspects of thedisclosure, the disclosure is not limited to these exemplary illustratedunits. Aspects of the disclosure may be suitably employed in manydevices, which include the disclosed devices.

FIG. 8 is a block diagram illustrating a design workstation used forcircuit, layout, and logic design of a semiconductor component, such asthe inductors disclosed above. A design workstation 800 includes a harddisk 802 containing operating system software, support files, and designsoftware such as Cadence or OrCAD. The design workstation 800 alsoincludes a display 804 to facilitate design of a circuit 806 or asemiconductor component 808 such as an inductor. A storage medium 810 isprovided for tangibly storing the design of the circuit 806 or thesemiconductor component 808. The design of the circuit 806 or thesemiconductor component 808 may be stored on the storage medium 810 in afile format such as GDSII or GERBER. The storage medium 810 may be aCD-ROM, DVD, hard disk, flash memory, or other appropriate device.Furthermore, the design workstation 800 includes a drive apparatus 812for accepting input from or writing output to the storage medium 810.

Data recorded on the storage medium 810 may specify logic circuitconfigurations, pattern data for photolithography masks, or mask patterndata for serial write tools such as electron beam lithography. The datamay further include logic verification data such as timing diagrams ornet circuits associated with logic simulations. Providing data on thestorage medium 810 facilitates the design of the circuit 806 or thesemiconductor component 808 by decreasing the number of processes fordesigning semiconductor wafers.

For a firmware and/or software implementation, the methodologies may beimplemented with modules (e.g., procedures, functions, and so on) thatperform the functions described herein. A machine-readable mediumtangibly embodying instructions may be used in implementing themethodologies described herein. For example, software codes may bestored in a memory and executed by a processor unit. Memory may beimplemented within the processor unit or external to the processor unit.As used herein, the term “memory” refers to types of long term, shortterm, volatile, nonvolatile, or other memory and is not to be limited toa particular type of memory or number of memories, or type of media uponwhich memory is stored.

If implemented in firmware and/or software, the functions may be storedas one or more instructions or code on a computer-readable medium.Examples include computer-readable media encoded with a data structureand computer-readable media encoded with a computer program.Computer-readable media includes physical computer storage media. Astorage medium may be an available medium that can be accessed by acomputer. By way of example, and not limitation, such computer-readablemedia can include RAM, ROM, EEPROM, CD-ROM or other optical diskstorage, magnetic disk storage or other magnetic storage devices, orother medium that can be used to store desired program code in the formof instructions or data structure and that can be accessed by acomputer; disk and disc, as used herein, includes compact disc (CD),laser disc, optical disc, digital versatile disc (DVD) and Blu-ray discwhere disks usually reproduce data magnetically, while discs reproducedata optically with lasers. Combinations of the above should also beincluded within the scope of computer-readable media.

In addition to storage on computer-readable medium, instructions and/ordata may be provided as signals on transmission media included in acommunication apparatus. For example, a communications apparatus mayinclude a transceiver having signals indicative of instructions anddata. The instructions and data are configured to cause one or moreprocessors to implement the functions outlined in the claims.

Although the present disclosure and its advantages have been describedin detail, it should be understood that various changes, substitutionsand alterations can be made herein without departing from the technologyof the disclosure as defined by the appended claims. For example,relational terms, such as “above” and “below” are used with respect to asubstrate or electronic device. Of course, if the substrate orelectronic device is inverted, above becomes below, and vice versa.Additionally, if oriented sideways, above and below may refer to sidesof a substrate or electronic device. Moreover, the scope of the presentapplication is not intended to be limited to the particularconfigurations of the process, machine, manufacture, and composition ofmatter, means, methods and steps described in the specification. As oneof ordinary skill in the art will readily appreciate from thedisclosure, processes, machines, manufacture, compositions of matter,means, methods, or steps, presently existing or later to be developedthat perform substantially the same function or achieve substantiallythe same result as the corresponding configurations described herein maybe utilized according to the present disclosure. Accordingly, theappended claims are intended to include within their scope suchprocesses, machines, manufacture, compositions of matter, means,methods, or steps.

Those of skill would further appreciate that the various illustrativelogical blocks, modules, circuits, and algorithm steps described inconnection with the disclosure herein may be implemented as electronichardware, computer software, or combinations of both. To clearlyillustrate this interchangeability of hardware and software, variousillustrative components, blocks, modules, circuits, and steps have beendescribed above generally in terms of their functionality. Whether suchfunctionality is implemented as hardware or software depends upon theparticular application and design constraints imposed on the overallsystem. Skilled artisans may implement the described functionality invarying ways for each particular application, but such implementationdecisions should not be interpreted as causing a departure from thescope of the present disclosure.

The various illustrative logical blocks, modules, and circuits describedin connection with the disclosure herein may be implemented or performedwith a general-purpose process, a digital signal processor (DSP), anapplication specific integrated circuit (ASIC), a field programmablegate array (FPGA) or other programmable logic device, discrete gate ortransistor logic, discrete hardware components, or any combinationthereof designed to perform the functions described herein. Ageneral-purpose processor may be a microprocessor, but in thealternative, the processor may be any conventional processor,controller, microcontroller, or state machine. A processor may also beimplemented as a combination of computing devices, e.g., a combinationof a DSP and a microprocessor, multiple microprocessors, one or moremicroprocessors in conjunction with a DSP core, or any other suchconfiguration.

The steps of a method or algorithm described in connection with thedisclosure may be embodied directly in hardware, in a software moduleexecuted by a processor, or a combination of the two. A software modulemay reside in RAM, flash memory, ROM, EPROM, EEPROM, registers, harddisk, a removable disk, a CD-ROM, or any other form of storage mediumknown in the art. An exemplary storage medium is coupled to theprocessor such that the processor can read information from, and writeinformation to, the storage medium. In the alternative, the storagemedium may be integral to the processor. The processor and the storagemedium may reside in an ASIC. The ASIC may reside in a user terminal. Inthe alternative, the processor and the storage medium may reside asdiscrete components in a user terminal.

The previous description is provided to enable any person skilled in theart to practice the various aspects described herein. Variousmodifications to these aspects will be readily apparent to those skilledin the art, and the generic principles defined herein may be applied toother variations without departing from the spirit or scope of thedisclosure. Thus, the disclosure is not intended to be limited to theexamples and designs described herein but is to be accorded the widestscope consistent with the principles and novel features disclosedherein.

What is claimed is:
 1. A vertical inductor structure, comprising: afirst laminate substrate having a ground plane layer internal to thefirst laminate substrate; a first portion of the vertical inductorstructure formed within the first laminate substrate, spaced apart fromthe ground plane layer, and located between the ground plane layer andan exterior surface of the first laminate substrate; a second laminatesubstrate mounted on the first laminate substrate; a second portion ofthe vertical inductor structure formed within the second laminatesubstrate, each respective laminate substrate of the first laminatesubstrate and the second laminate substrate including: a plurality offirst traces embedded in a layer of the respective laminate substrate; aplurality of first vertical columns, each of which is coupled to a firstend of a respective one of the plurality of first traces; and aplurality of second vertical columns, each of which is coupled to asecond end of the respective one of the plurality of first traces,wherein the second laminate substrate is mounted on the first laminatesubstrate such that each of the plurality of first vertical columns ofthe first laminate substrate is coupled to a respective one of theplurality first vertical columns of the second laminate substrate, andeach of the plurality of second vertical columns of the first laminatesubstrate is coupled to a respective one of the plurality of secondvertical columns of the second laminate substrate; and wherein theexterior surface of the first laminate substrate faces the secondlaminate substrate.
 2. The vertical inductor structure of claim 1,wherein each of the first laminate substrate and the second laminatesubstrate includes a plurality of second traces, the plurality of secondtraces are parallel with the plurality of first traces and embedded in asecond layer of the substrate.
 3. The vertical inductor structure ofclaim 2, wherein each of the first laminate substrate and the secondlaminate substrate further includes a plurality of metal-filled viasdisposed along each of the plurality of first traces between the firstend and the second end, the plurality of metal-filled vias coupling eachof the plurality of first traces to a respective one of the plurality ofsecond traces.
 4. The vertical inductor structure of claim 2, whereineach of the first laminate substrate and the second laminate substratefurther includes: a plurality of third vertical columns, each of whichis coupled to a respective one of the plurality of first tracesproximate the first end; and a plurality of fourth vertical columns,each of which is coupled to a respective one of the plurality of firsttraces proximate the second end, wherein each of the plurality of thirdvertical columns of the first laminate substrate is coupled to arespective one of the plurality of third vertical columns of the secondlaminate substrate, and each of the plurality of fourth vertical columnsof the first laminate substrate is coupled to a respective one of theplurality of fourth vertical columns of the second laminate substrate.5. The vertical inductor structure of claim 1, wherein each of theplurality of first and second vertical columns includes a plurality ofstacked, metal-filled vias embedded in the respective laminatesubstrate.
 6. The vertical inductor structure of claim 5, wherein eachof the plurality of first and second vertical columns further includes aplurality of capture pads embedded in the respective laminate substrate,each of the plurality of capture pads disposed between each of theplurality of stacked, metal-filled vias.
 7. The vertical inductorstructure of claim 1, wherein the first laminate substrate is coupled tothe second laminate substrate using connections selected from the groupconsisting of flip-chip bumps, ball grid arrays, solder on pad (SOP),and copper pillars.
 8. The vertical inductor structure of claim 1,further comprising a shield layer and a molding, the molding separatingthe second laminate substrate from the shield layer.
 9. The verticalinductor structure of claim 8, wherein the molding is comprised of apolymer material.
 10. The vertical inductor structure of claim 1,wherein the first laminate substrate includes a first number of layers,and the second laminate substrate includes a second number of layers.11. The vertical inductor of claim 10, wherein each of the first numberof layers and the second number of layers is in the range of 2 layers to10 layers.
 12. The vertical inductor structure of claim 10, wherein thefirst number of layers equals the second number of layers.
 13. Thevertical inductor structure of claim 10, wherein the plurality of firsttraces are comprised of copper.
 14. The vertical inductor structure ofclaim 1, integrated into a radio frequency (RF) front-end module, the RFfront-end module incorporated into at least one of a music player, avideo player, an entertainment unit, a navigation device, acommunications device, a personal digital assistant (PDA), a fixedlocation data unit, a mobile phone, and a portable computer.